Photoresist (PR) is a key material in photolithography, essential for manufacturing semiconductors, PCBs, and display panels. The global PR market is highly concentrated, with Merck, Dow Chemical, and Tokyo Ohka Kogyo (TOK) controlling over 90% due to strict reliability standards that create high entry barriers. A report from Taiwan’s Ministry of Economic Affairs underscores the urgent need to develop domestic fine-line width photoresist technology.